Chemkin-LPCVD Thermal Analyzer and Furnace Manual

http://www.cadfamily.com/a/CAE_FEA_CFD/Chemkin/Chemkin-LPCVD-Thermal-Analyzer-and-Furnace-Manual_3262.html

Introduction
Chemical vapor deposition (CVD) is a chemical process used for the deposition of
thin films in the semiconductor and related materials industries. A common design
used for the deposition of such films is the multi-wafer low-pressure batch furnace,
shown schematically in Figure 1-1. In these reactors, up to several hundred silicon
wafers are stacked concentrically and processed in a single batch run. These lowpressure CVD (LPCVD) reactors are thus well suited to large-scale wafer production.
Originally, these “workhorses” of the silicon microelectronics industry had horizontal
racks of wafers, but modern tools have a vertical orientation that reduces the
“footprint” of the reactor on the factory floor.